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nanoplus
 



 nanoplus GmbH
 Oberer Kirschberg 4
 D-97218 Gerbrunn
 Germany

 info@nanoplus.com
 phone: +49-931 90 827-0
 fax: +49-931 90 827-19


nanoplus
Technology Development E-mail

2 and 3 D Patterning:

    Nanoplus possesses wide experience in semiconductor patterning and processing: Two- and three-dimensional patterning of semiconductor materials comprises micro (DBR) lasers, micro lens, grating and photonic crystal structures. Other structures can be custom designed and manufactured. Nanoplus is able to pattern various kind of structures on µm- and nm-scale on customer provided substrates. The patterns are usually defined by optical or electron-beam lithograpy. In addition, nanoplus is investigating applications of nanoimprint lithography (see below).
    The lithographical patterns are transferred into the semiconductor heterostructure by various reactive dry etching techniques. Here nanoplus processes are optimized for e.g. smooth perpendicular sidewalls and a precise depth control. High accuracy is needed for patterns in the range of the light wavelength in the semiconductor, e.g. micro lasers, gratings or photonic crystals structures.
    Patterning using 3-dimensional lithography combined with special etch processes has been done for structures like optical micro lenses, reflecting gratings and micro coils for nanoliter NMR spectroscopy applications.

    Materials: III/V:

    • III/V compounds: GaAs, InP, GaSb based heterostructures
      In addition to well established material systems based on these compounds, nanoplus successfully developed and fabricated optoelectronic devices based on new active materials (e.g. GaInAsN quantum well or InGaAs quantum dot material for 1.3µm emission on GaAs substrate) within various international cooperations.
    • II/VI compounds including CdTe, ZnSe based heterostructures

    Imprint

    Nanoimprint lithography offers the advantages of a parallel process permitting fast lithography over large areas together with a high resolution with feature sizes down to 10nm. nanoplus offers a variety of solutions dealing with nanoimprint lithography, which include:
    - the fabrication of customer designed stamps (using e-beam lithography and various etching techniques)
    - devices manufacuring by imprint technology
    - complete development of a customized imprint process adopted to your specific needs.
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